Pure Gas-Organic:
Gas | Chemical Formula | Spec. (%) | Impurity(ppm) |
methane | 99.9% | O2+Ar<50 ,H2<50, N2<250 ,C2H6<600, H2O<50 | |
99.99% | O2+Ar<10,H2<10, N2<35 ,C2H6<25, H2O<15 | ||
99.995% | O2+Ar<5,H2<5, N2<15 ,C2H6<15, H2O<5 | ||
99.999% | O2+Ar<1,H2<0.5, N2<4 ,C2H6<25, H2O<3,CO2<0.5,H2S<0.1 | ||
ethane | C2H6 | 99.9% | O2≤50, N2≤40 ,HC≤1000 |
99.99% | O2≤2 ,HC≤100, N2≤5, H2O≤5 ,CO2≤5 | ||
ethylene | C2H4 | 99.95% | O2≤5 ,CH4,+C2H6≤500, C2+C3≤10,H2O≤5,,H2≤5,CO2≤5,CO≤1,C2H2≤3 |
propane | C3H8 | 98.5% | O2≤100 ,HC≤14000 ,CO+CO2≤10, H2O≤12 |
99.95% | O2≤10, HC≤400 ,N2≤40, H2O≤5 ,CO2≤10 | ||
propylene | C3H6 | 99.5% | HC≤1000, C3H8≤4000 |
99.99% | N2≤10 ,C3H8≤100, C4H6-1.3≤5 ,CH4≤5 ,C4H10≤5, C2H6≤50, C4H8≤5 | ||
Electronic Industry gas propylene | C3H6 | 99.99% | N2≤5,O2≤1 ,HC≤10 ,CO+CO2≤10, H2O≤2,C3H8≤80, |
propadiene | C3H4 | 98% | Propyne≤20000 |
propyne | C3H4 | 98% | Propadiene≤20000 |
cyclopropane | C3H6 | 99% | |
n-butane | C4H10 | 99% | O2≤15 ,H2O≤20 ,HC≤1% |
99.5% | O2≤15 ,H2O≤12 ,HC≤5000, CO+CO2≤10 | ||
99.95% | O2≤10 ,H2O≤10 ,HC≤500 ,CO+CO2≤10 | ||
iso-butane | C4H10 | 99.5% | O2≤15 ,C3H8≤4000, C4(uns.)≤100, H2O≤15 ,n-C4H10≤2500, CO+CO2≤10 |
99.99% | O2≤10 ,C3H8≤10 ,C4(uns.)≤50, H2O≤5, n-C4H10≤50, CO+CO2≤10 | ||
1-Butene | C4H8 | 99.9% | H2O≤10 ,HC≤1000 |
cis-2-Butene | C4H8 | 99.4% | HC≤6000 |
trans-2-Butene | C4H8 | 99.4% | HC≤6000 |
isobutylene | C4H8 | 99.99% | H2O≤5, HC≤100 |
1.3-Butadiene | C4H6 | 99.8% | O2≤5 ,N2≤10, HC≤2000 |
n-Pentane | C5H12 | 99.5% | C5H10<0.1wt% i-C5H12: 0.4wt% |
iso-Pentane | C5H12 | 99.3% | n-C5H12: 0.5% |
Methyl Chloride | CH3Cl | 99 % | Methanol≤4000 |
Methyl Bromide | CH3Br | 99.99% | Oxygen≤1,Moisture≤2 |
Vinyl Chloride | C2H3Cl | 99.9% |
All kinds of hydrocarbon alkyl, olefins can be provided. |
Pure Gas-Inorganic:
Gas | Chemical Formula | Spec. (%) | Impurity(ppm) |
helium | He | 99.995% | CH4<1 ,CO2<1, Ne<15, H2<3, CO<1, H20<10 ,O2<3,N2<10 |
99.999% | O2<1,CH4<0.5, CO2<0.5, Ne<4 ,H2<1, CO<0.5 ,H2O<3 ,N2<2 | ||
99.9995% | O2<0.5 ,CH4<0.1,CO2<0.2, Ne<1, H2<0.1,CO<0.1 ,H2O<1 | ||
Electronic Industry gas helium | He | 99.9995% | O2<0.5 ,THC<0.5, CO+CO2<1,H2O<0.5,N2<2 |
99.9999% | O2<0.2 ,THC<0.1, CO<0.1,CO2<0.1,H2O<0.2,N2<0.5 | ||
argon
| Ar | 99.99% | O2≤10 ,CH4≤5 ,N2≤50 ,H2≤5, H2O≤15,CO≤5,CO2≤10 |
99.999% | O2≤1.5 ,CH4≤0.4, N2≤4, H2≤0.5, H2O≤3,CO≤0.3,CO2≤0.3 | ||
99.9995% | O2≤1, THC≤0.5, N2≤2, H2≤0.5, H2O≤1 | ||
Electronic Industry gas argon | Ar | 99.9992 | O2<0.5 ,THC<0.5 ,N2<5 ,H2<1, H2O<0.5,CO+CO2<0.5 |
99.9999% | O2<0.2 ,THC<0.1 ,N2<0.5 ,H2<0.1, H2O<0.2,CO<0.1,CO2<0.1 | ||
hydrogen
| H2
| 99.99% | O2≤5 ,CO2≤5, N2≤60, CH4≤10 ,CO≤5, H2O≤10 |
99.999% | O2≤1 ,CO2≤1, N2≤5, CH4≤1 ,CO≤1 ,H2O≤3 | ||
99.9999% | O2+Ar≤0.2, N2≤0.4,CO2≤0.1,CO≤0.1, CH4≤0.2,H2O≤0.5 | ||
Electronic Industry gas hydrogen | H2
| 99.9995% | 99.9995% O2<0.5, N2<2,CO2<0.5,CO<0.5, CH4<0.5,H2O<0.5 |
99.9997% | 99.9997% O2<0.2, N2<2,CO2+CO<0.2, CH4<0.2,H2O<0.2 | ||
99.9999% | 99.9999% O2<0.2, N2<0.5,CO2<0.05,CO<0.05, CH4<0.05,H2O<0.2 | ||
nitrogen | N2 | 99.99% | O2≤50 ,CO2≤10, H2≤15, CO≤5, H2O≤15, CH4≤5 |
99.999% | O2≤3 ,H2O≤3, H2≤1, HC≤3 | ||
99.9999% | O2≤0.1 ,H2O≤0.5, H2≤0.1, HC≤0.3 ,Ar≤2 | ||
Electronic Industry gas nitrogen | N2 | 99.9996% | O2<0.5,H2O<0.5, H2<1, CO<0.5,CO2<0.5,THC<0.5 |
99.9999% | O2<0.2,H2O<0.2, H2<0.1, CO<0.1,CO2<0.1,THC<0.1 | ||
oxygen | O2 | 99.995% | H2≤1,Ar≤10 ,CO2≤1, N2≤20, THC≤2 ,H2O≤3 |
99.999% | H2≤0.5,Ar≤2 ,CO2≤0.5, N2≤5, THC≤0.5 ,H2O≤2 | ||
99.9999% | H2≤0.1,Ar≤0.2 ,CO2≤0.1, N2≤0.1, THC≤0.1 ,H2O≤0.5 | ||
Electronic Industry gas oxygen | O2 | 99.9998% | H2<0.1,Ar<1,CO2<0.1,,CO<0.1, N2<0.5, THC<0.1 ,H2O<0.1 |
99.98% | H2<1,Ar<100,CO2<1,,CO<1, N2<30, THC<1 ,H2O<1,Kr<10,No<1 | ||
Carbon dioxide | CO2 | 99.995% | O2≤10, H2O≤5, N2≤20, CO≤1 ,HC≤10 |
99.999% | O2≤1,H2O≤2,N2≤5,CO≤1,HC≤1 | ||
Carbon dioxide | CO | 99.99% | H2<10,O2+Ar<10,N2<50,CO2<20,H2O<5,THC<5 |
99.998 | H2<1,O2+Ar<2,N2<10,CO2<4,H2O<1,THC<2 | ||
SulfurDioxide | SO2 | 99.9% | O2+N2<100,H2O<10,other<200 |
Nitric Monoxide | NO | 99.5% | N2O<4000,NO2<2000,N2<300,CO2<500 |
Nitrogen Dioxide | NO2 | 99.9% | |
Nitrous Oxide | N2O | 99.99% | |
Electronic Industry gas Nitrous Oxide | N2O | 99.997% | O2<2 ,CO2<2, CO<1,N2<10, C1~C5<1 ,H2O<3,NH3<5,NO<1,NO2<1 |
99.9994 | O2<0.5 ,CO2<0.5, CO<0.1,N2<3, C1~C5<0.1 ,H2O<1 | ||
Neon | Ne | 99.995% | H2≤2 ,N2≤5, He≤40, THC≤1 ,O2+Ar≤2, H2O≤2 |
99.999% | O2≤1 ,N2≤5, H2O≤2 ,He≤10 | ||
Krypton | Kr | 99.99% | N2≤20 ,H2≤2, O2+Ar≤5 ,Xe≤50, H2O≤5, HC≤3 |
99.999% | N2≤3 ,H2≤0.5 ,O2+Ar≤1.5, Xe≤2 ,H2O≤2, CO≤0.3, CO2≤0.4,CH4≤0.3 | ||
Xenon | Xe
| 99.99% | N2≤20, Ar+O2≤5, N2O≤1 ,H2≤2 ,Kr≤50, H2O≤3 ,HC≤3 |
99.999% | N2≤2.5, CO≤0.2, CO2≤0.3,CH4≤0.3,N2O≤0.2, O2+Ar≤1.5 ,H2O≤2, H2≤0.5, Kr≤2 | ||
Hydrogen Sulfide | H2S | 99.9% | H2<200ppm,O2+N2<100ppm,H2O<3ppm |
Liquid Chlorine | Cl2 | 99.9% | CO2<400,CO <10,H2<200,N2<100,O2<20,H2O <100 |
Chlorine | Cl2 | 99.999% | |
Ammonia | NH3 | 99.999% | O2<1.0ppm,N2 <2.0ppm,CO<1.0ppm,H2O<2.0ppm,THC(C1~C3) <1.0ppm |
Sulfur Hexafluoride | SF6 | 99.999% | O2+Ar≤2 ,N2≤2,H20≤3, HF≤0.1, CF4≤1,CO≤0.5, CO2≤0.5,CH4≤0.5 |
Air | Air | O2:19.5~22.5% | H2O≤5, CO/CO2≤0.5, THC≤5 |
Zero Air | O2: 19.5~22.5% | H2O≤5, CO/CO2≤0.5, THC≤0.1 |
Package:
● Normally package with 40L seamless cylinder, filling pressure and content according to national standards.
● Or using 8L; 4L or other cylinder capacity as demand.
● Corrosive and reactive gas packing with stainless steel valve and specially inner treatment cylinder